Author Details
Glaz, O. G.
Issue | Section | Title | File |
Vol 53, No 1 (2024) | ТЕХНОЛОГИИ | Interconnects Materials for Integrated Circuit Technology Below 5 Nm Node | |
Vol 54, No 2 (2025) | NANOSTRUCTURES | Electrical characteristics of ruthenium lines with a cross-sectional area less than 1000 nm2 |